Automegasamdri®-938

  • The New Supercritical Automegasamdri®-938 System was developed by our in-house design team whose goal was to listen to and incorporate your needs into our next generation.
  • The classic features you have come to expect for decades that enable smooth operation, precise control and reproducibility are again evident in our most current design!
  • Process up to Five 8" Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788C
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  • A dedicated initial Slow Fill into the process chamber allows ideal fluid dynamics preserving the most sensitive micro devices.
  • Maintenance made easy via accessible components including the external Post-Purge-Filter assembly.
  • Patent Pending "Vortex Swirl": Non-mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices.
  • Extremely Efficient integrated Closed Cooling Loop dropping chamber temperature quickly for shorter process run times.
  • The internal SOTER(tm) condenser quietly captures and separates CO2 exhaust and waste alcohols.
  • Our original Chamber Inserts enable chamber I.D. variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
  • Process chamber LCO2 filtration down to 0.08µm with 99.999%+ particle retention.
  • Processes up to five 8" wafers each run. Included are the following HF Compatible Wafer Holders: 8", 6", 4", 3", 2" and 10mm Die Holders.
  • Chamber Illumination via viewing window facilitates chamber status visualization.
  • Automatic process with factory default recipe or the ability to customize your own!
  • All internal surfaces are inert to CO2 and ultrapure alcohols.
  • Repeatable operating parameters insuring "reproducibility" of results.
  • Safety operation features integrated into both temperature and pressure automatic regulation.
  • All electronic components meet CE, UL and/or U.S. Military Specifications.
  • Clean room static-free compatible design.
  • Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
  • System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
  • Chamber size: 8.50" I.D. x 1.25" Depth / Chamber volume: 1162 ml
  • 120V or 220V / 50-60Hz
  • LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.
  • High Pressure LCO2 flexi-SS316 Braided line for safe operation and easy installation 10ft/3m length included with system (Other lengths available upon request up to 100 ft/30m).
  • Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose.
  • Static free exhaust tubing included for all exhaust ports.
  • Spare chamber O-rings (3), chamber lamps (2), and slo-blow fuses (2x3A and 2x8A).
  • Chamber Inserts included: 8" to 6"/ 6" to 4" / 4" to 3" / 3" to 2" / 2" to 1.25" ! Allows for multiple wafer size drying.
  • HF compatible wafer holders included: 8", 6", 4", 3", 2" and 10mm square die. Each holder can load up to five substrates each.
  • 2 year warranty on all parts and labor.
  • Free lifetime technical support.
  • 8760-03: :KNURL NUT for 8" Process Chamber
  • 8760-41: :3 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
  • 8760-42: :8 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
  • 8770-13: :LED CHAMBER LAMP, 120V
  • 8770-32: :HIGH-PRESSURE HOSE, 5ft
  • 8770-33: :HIGH-PRESSURE HOSE, 10ft
  • 8770-80: :CHAMBER LID for 4" Process Chamber
  • 8785: :Double T-Filter Assembly
  • 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
  • 8784-05: :Gasket for LCO2 Tank Connect
  • 8770-51T/916B: :O-Ring for AutomegaSamdri®-938 and AutomegaSamdri®-916B
  • 8770-48: :Flow Meter - Use with Automegasamdri®-938 or Automegasamdri®-916B(180 SCFH)
  • 8770-54: :LCO2 TANK SCALE W/ REMOTE READOUT
  • 8768H: :8" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768A: :6" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768F: :5" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768B: :4" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768C: :3" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768D: :2" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768G: :1" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die

Upcoming Exhibitions and Conferences

Visit us at the 2018 NESM Spring Symposium

Date: April 27, 2018

Location: MBL, Woods Hole, Massatusettss

Visit us at the SEMS 54th annual meeting

Date: May 17, 2018

Location: Courtyard Marriott Downtown Columbia, South Carolina