Touch Screen Series C

  • A dedicated slow fill line allows for ideal internal chamber fluid dynamics for the most sensitive devices
  • Thermostatically controlled internal condenser
  • Temperature controlled valving
  • Stainless steel tubing with an internal filtration system down to 0.08 µm to protect samples and system function
  • Non mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices
  • Chamber flexibility with inserts and holders allowing for processing processing up to 8" wafers, pieces and die
  • Made in U.S.A.
  Download Brochure (PDF)
  Operational Demo Video
  Active Image for CPD and Accessories

Application Images

High aspect ratio silicon gratings Massachusetts Institute of Technology

RF MEMS Capacitive Switch NASA-Glenn Research Center/Communications Technology Division, USA

E-beam resist pattern quality after CPD Process NRL Nano Fab - Washingtopn, DC

Array of low stress silicon nitride coupled oscillators with gold actuation leads. 1,100x Cornell Nanoscale Facility and Department of Applied Physics, USA

Search

Upcoming Exhibitions and Conferences

Visit us at The New England Society for Microscopy (NESM)
2017 Spring Symposium

Date: April 28, 2017

Location: Marine Biological Laboratory, Woods Hole, Massachusetts

Visit us at rhe 19th International Conference on
Solid-State Sensors, Actuators and Microsystems
Transducers 2017
Booth # 40

Date: June 19-22, 2017

Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan