Automegasamdri®-915B, Series C

  • Process up to 6" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785D
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  • The Automegasamdri®-915B, Series C maintains tousimis® process quality and achieves a small facility foot print by utilizing an efficient "closed loop refrigeration and waste alcohol collection" engineered design.*
  • 35 years of tousimis® CPD experience enables smooth operation and precise control. HF Compatible Wafer Holders* and Chamber Inserts* are provided allowing anti-stiction MEMS processing of various wafer sizes and die.
Features
  • High efficiency internal closed loop refrigeration.* (22°C to operational in less than 4 minutes)!
  • Post-Purge-Filter easily accessible for maintenance ease.*
  • The patented internal SOTER™ condenser* quietly captures and separates CO2 exhaust and waste alcohols.
  • Unique chamber inserts* enable variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
  • Process up to 5 x 6" wafers per process run. Also comes with additional HF Compatible Wafer Holders* to process 5 x 4", 5 x 3", 5 x 2" diameter wafers or 5 x 10mm square die (tousimis® HF compatible Wafer Holders* may be used to etch and process your wafers minimizing handling).
  • Chamber illumination with viewing window facilitates chamber status visualization.*
  • Microprocessor controller allows for complete automatic processing.*
  • All internal surfaces are inert to CO2 and ultrapure alcohols.
  • Repeatable operating parameters insuring "reproducibility" of results.
  • Static pressure control module helps insure automatic safe pressure stability.
  • Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm.
  • Control panel LED's instantly indicate process mode at a glance.
  • Clean room static-free compatible design.
  • All electronic components meet CE, UL and/or U.S. Military Specifications.
Specifications
  • Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
  • System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
  • Chamber size: 6.50" I.D. x 1.25" Depth / Chamber volume: 679 ml
  • Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000 psi
  • 120V / 50-60Hz (Other voltage units also available. Please Inquire)
  • LCO2 flow is controlled through Micro Metering Valves with Vernier handles for easily control flow rates.*
Standard Accessories
  • LCO2 High Pressure braided stainless steel inert Teflon® lined hose. 10ft (~ 3m) long for clean room operation (Other lengths available upon request at a nominal charge).
  • Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose. Flows LCO2 twice thru 0.5µm filters with 99.5% particulate retention prior to LCO2 entering Automegasamdri®-915B.
  • Tool set included for connecting LCO2 chamber supply line.
  • Static free exhaust tubing for all exhaust outlets.
  • Internal stainless and nickel scintered filtration systems incorporated to protect lines, wafers, and valves down to 0.08µm.
  • Spare chamber O-ring (3), chamber lamps (2), and slo-blow fuses.
  • Complete wafer size process flexibility! 4 chamber inserts* enable 6.5" chamber ID reduction down to smaller chamber ID sizes for processing wafers and die from a range including: 6", 4", 3", 2", and 1.25" ! Allows for multiple wafer size drying.
  • 6", 4", 3", 2" diameter wafer holders and 10mm square die holders included. Holders are HF compatible and can holds up to 5 wafers or die each.
  • 2 year warranty on all parts and labor. Free lifetime technical support consultation by our scientific staff.
Optional Accessories
  • 8760-02: :KNURL NUT for tousimis® Autosamdri®-815B and Automegasamdri®-915B
  • 8760-41: :3 AMP FUSE for Autosamdri® and Automegasamdri® Series C
  • 8760-42: :8 AMP FUSE for Autosamdri® and Automegasamdri® Series C
  • 8770-10: :CHAMBER LAMP, 120Volt/60Hz
  • 8770-32: :HIGH-PRESSURE HOSE, 5ft
  • 8770-33: :HIGH-PRESSURE HOSE, 10ft
  • 8770-70: :CHAMBER LID for tousimis AutomegaSamdri®-915B
  • 8785: :Double T-Filter Assembly
  • 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
  • 8784-05: :Gasket for LCO2 Tank Connect
  • 8770-51T/915B: :O-Ring for AutomegaSamdri®-915B
  • 8770-47: :Flow Meter - Use with Automegasamdri®-915B (100 SCFH)
  • 8770-53: :POWER CABLE
  • 8770-54: :LCO2 TANK SCALE W/ REMOTE READOUT
  • 8770-56A: :Step-Down Transformer, 200-240V → 110-120V, 3000W
  • 8770-83A: :Internal 0.5µm 316SS Particulate Line Filter
  • 8768A: :6" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768F: :5" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768B: :4" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768C: :3" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768D: :2" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768G: :1" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die

Application Images

MEMS Shock Sensor Naval Surface Warfare Center Indian Head, MD

RF MEMS Device Middle East Technical University, Turkey

MEMS Based Resonant Device Cornell Nanoscale Facility and Department of Applied Physics, USA

MEMS Shock Sensor (Multi-Directional) Naval Surface Warfare Center Indian Head, MD

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Visit us at The New England Society for Microscopy (NESM)
2017 Spring Symposium

Date: April 28, 2017

Location: Marine Biological Laboratory, Woods Hole, Massachusetts

Visit us at rhe 19th International Conference on
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Transducers 2017
Booth # 40

Date: June 19-22, 2017

Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan