- High efficiency internal closed loop refrigeration.* (22°C to operational in less than 4 minutes)!
- Post-Purge-Filter easily accessible for maintenance ease.*
- The patented internal SOTER™ condenser* quietly captures and separates CO2 exhaust and waste alcohols.
- Unique chamber inserts* enable variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
- Process up to 5 x 6" wafers per process run. Also comes with additional HF Compatible Wafer Holders* to process 5 x 4", 5 x 3", 5 x 2" diameter wafers or 5 x 10mm square die (tousimis® HF compatible Wafer Holders* may be used to etch and process your wafers minimizing handling).
- Chamber illumination with viewing window facilitates chamber status visualization.*
- Microprocessor controller allows for complete automatic processing.*
- All internal surfaces are inert to CO2 and ultrapure alcohols.
- Repeatable operating parameters insuring "reproducibility" of results.
- Static pressure control module helps insure automatic safe pressure stability.
- Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm.
- Control panel LED's instantly indicate process mode at a glance.
- Clean room static-free compatible design.
- All electronic components meet CE, UL and/or U.S. Military Specifications.
Automegasamdri®-915B, Series C
- Process up to 6" wafers
- Fully Automatic Process
- Low LCO2 Consumption
- Small Foot Print design
- Minimal Facility Utility Requirements
- Made in U.S.A.
- The Automegasamdri®-915B, Series C maintains tousimis® process quality and achieves a small facility foot print by utilizing an efficient "closed loop refrigeration and waste alcohol collection" engineered design.*
- 35 years of tousimis® CPD experience enables smooth operation and precise control. HF Compatible Wafer Holders* and Chamber Inserts* are provided allowing anti-stiction MEMS processing of various wafer sizes and die.
Features
Specifications
Standard Accessories
Optional Accessories
CPD MULTI-APPLICATIONS
- Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
- System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
- Chamber size: 6.50" I.D. x 1.25" Depth / Chamber volume: 679 ml
- Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000 psi
- 120V / 50-60Hz (Other voltage units also available. Please Inquire)
- LCO2 flow is controlled through Micro Metering Valves with Vernier handles for easily control flow rates.*
- LCO2 High Pressure braided stainless steel inert Teflon® lined hose. 10ft (~ 3m) long for clean room operation (Other lengths available upon request at a nominal charge).
- Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose. Flows LCO2 twice thru 0.5µm filters with 99.5% particulate retention prior to LCO2 entering Automegasamdri®-915B.
- Tool set included for connecting LCO2 chamber supply line.
- Static free exhaust tubing for all exhaust outlets.
- Internal stainless and nickel scintered filtration systems incorporated to protect lines, wafers, and valves down to 0.08µm.
- Spare chamber O-ring (3), chamber lamp (1), and slo-blow fuses.
- Complete wafer size process flexibility! 4 chamber inserts* enable 6.5" chamber ID reduction down to smaller chamber ID sizes for processing wafers and die from a range including: 6", 4", 3", 2", and 1.25" ! Allows for multiple wafer size drying.
- 6", 4", 3", 2" diameter wafer holders and 10mm square die holders included. Holders are HF compatible and can holds up to 5 wafers or die each.
- 2 year warranty on all parts and labor. Free lifetime technical support consultation by our scientific staff.
- 8760-02: :KNURL NUT for 4" and 6" Process Chamber
- 8760-41: :3 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8760-42: :8 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8770-10: :CHAMBER LAMP, 120Volt/60Hz
- 8770-32: :HIGH-PRESSURE HOSE, 5ft
- 8770-33: :HIGH-PRESSURE HOSE, 10ft
- 8770-70: :CHAMBER LID for 6" Process Chamber
- 8785: :Double T-Filter Assembly
- 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
- 8784-05: :Gasket for LCO2 Tank Connect
- 8770-51T/915B: :O-Ring for Automegasamdri®-936 and Automegasamdri®-915B
- 8770-47: :Flow Meter - Use with Automegasamdri®-936 and Automegasamdri®-915B (100 SCFH)
- 8770-53: :POWER CABLE
- 8770-54: :LCO2 TANK SCALE W/ REMOTE DISPLAY
- 8770-56A: :Step-Down Transformer, 200-240V → 110-120V, 3000W
- 8770-83A: :Internal 0.5µm 316SS Particulate Line Filter
- 8768A: :6" - 150mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768F: :5" - 125mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768B: :4" - 100mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768C: :3" - 75mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768D: :2" - 50mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768G: :1" - 25mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die
Application Images
Rotary Microfan with Rotary Motor ETH, Switzerland
Silicon Microrobots - Elbow hinge University of California at Berkeley and Micropropulsion Corp. USA
MEMS Shock Sensor (Multi-Directional) Naval Surface Warfare Center Indian Head, MD
Hall C2, Booth no. 501
Date: November 12–15, 2024
Location: MESSE, Munich, Germany
Date: November 25–26, 2024
Location: Gyeongju Hwabaek International Convention Center, Korea
Booth # 10
Date: January 20-23, 2025
Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan