Applications

  • New Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • The Manual Critical Point Dryer with advanced auto-pressure and temperature control
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8755B

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  • The Semi Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8778B

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  • The fully Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8779B

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  • Large Capacity Fully Automatic Critical Point Dryer
  • Process large or numerous smaller samples

      

tousimis catalog# 8780B

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Upcoming Exhibitions and Conferences

Visit us at the EMC 2016

Date: August 29 - September 2, 2016

Location: Lyon Convention Center, France

Booth: # 11

Visit us at The Appalachian Regional Microscopy Society Fall Meeing

Date: October 6 - October 7, 2016

Location: Joint Institute for Advanced Materials, the University of Tennessee Knoxville

Visit us at the Singh Nano Week 2016

Date: October 24-27, 2016

Location: Singh Center for Nanotechnology, University of Pennsylvania