- Process up to Five 8" (200mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
- Process up to Five 6" (150mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
- Process up to Five 4" (100mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
- Multi-Application Digital Critical Point Dryer
- Patent Pending "Stasis Software" for Challenging Sample Types
- Available in 1.25", 2.50" and 3.40" chamber sizes
- Winner of 2012 Microscopy Today Innovation Award
- Precision process control
- Optional "Quick Release" sample holder (down to 2 µm in size)
- Program and save custom recipes
- Made in U.S.A.
- Process up to 6" (150mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Made in U.S.A.
- Process up to 4" (100mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Made in U.S.A.
- Large Capacity Fully Automatic Critical Point Dryer
- Process large or numerous smaller samples
- Process up to 1" (25mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Made in U.S.A.
- The fully Automatic Critical Point Dryer
- 1.25" ID chamber and 1.25" height
- The Semi Automatic Critical Point Dryer
- 1.25" ID chamber and 1.25" height
- The Manual Critical Point Dryer with advanced auto-pressure and temperature control
- 1.25" ID chamber and 1.25" height
Application Images
Fish Epidermal Keratocytes University of Pennsylvania
Drosophila Melanogaster University of Connecticut
Nanospider University of Missouri - EM Core Facility