• Process up to Five 8" (200mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788C

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  • Process up to Five 6" (150mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788B

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  • Process up to Five 4" (100mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788A

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  • Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • Process up to 6" (150mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785C

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  • Process up to 4" (100mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C

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  • Large Capacity Fully Automatic Critical Point Dryer
  • Process large or numerous smaller samples

      

tousimis catalog# 8780B

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  • Process up to 1" (25mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8779C

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  • The fully Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8779B

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  • The Semi Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8778B

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  • The Manual Critical Point Dryer with advanced auto-pressure and temperature control
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8755B

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Application Images

Hair bundle from outer hair cell in the adult mouse cochlea inner ear Decibel Therapeutics, Inc.

Mouse Rachea Electron Microscopy Laboratory, UC Davis

Arabidopsis University of Missouri - EM Core Facility

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Visit our European Distributor, S3 Alliance at the SEMICON Europa 2024

Hall C2, Booth no. 501

Date: November 12–15, 2024

Location: MESSE, Munich, Germany

Visit our Korean Distributor, Nanobiz Korea at the Korean Society of Microscopy Fall Meeting

Date: November 25–26, 2024

Location: Gyeongju Hwabaek International Convention Center, Korea

Visit us at The 38th International Conference on Micro Electro Mechanical Systems (IEEE MEMS 2025)

Booth # 10

Date: January 20-23, 2025

Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan