• Process up to Five 8" (200mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788C

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  • Process up to Five 6" (150mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788B

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  • Process up to Five 4" (100mm) Wafers per Process Run
  • Touchscreen Programmable Interface
  • First Time Ever...Previous Run Data Review
  • Integrated Chiller Loop Decreases LCO2 Consumption
  • Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788A

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  • Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • Process up to 6" (150mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785C

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  • Process up to 4" (100mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C

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  • Large Capacity Fully Automatic Critical Point Dryer
  • Process large or numerous smaller samples

      

tousimis catalog# 8780B

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  • Process up to 1" (25mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8779C

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  • The fully Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8779B

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  • The Semi Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8778B

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  • The Manual Critical Point Dryer with advanced auto-pressure and temperature control
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8755B

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Application Images

Fruit fly eye coated with platinum University of Missouri - EM Core Facility

Fruit Fly University of Missouri - EM Core Facility

Arabidapsis University of Missouri - EM Core Facility

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Visit our Chinese Distibutor, Tansi Technology at the 2024 Beijing EM Annual Conference

Booth # 32

Date: December 18, 2024

Location: Banquet Hall on the Second Floor of Zhongfu Building ,No. 18 Gongti East Road,Chaoyang District, Beijing

Visit us at The 38th International Conference on Micro Electro Mechanical Systems (IEEE MEMS 2025)

Booth # 10

Date: January 20-23, 2025

Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan