The Samdri® line of Supercritical Point Dryers is successfully used to increase yield and uniformity of MEMS devices. Liquid carbon dioxide is the transitional fluid used to process your delicate MEMS. The tousimis Samdri® line of Supercritical Point Drying tools used for the MEMS CO2 dry release after wet etching is a most beneficial anti-stiction tool for the MEMS fab.
Autosamdri®-934
Touchscreen Series C for 4" (100mm) Wafers
- Process up to Five 4" (100mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
Automegasamdri®-936
Touchscreen Series C for 6" (150mm) Wafers
- Process up to Five 6" (150mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
Automegasamdri®-938
Touchscreen Series C for 8" (200mm) Wafers
- Process up to Five 8" (200mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
Autosamdri®-931
Advanced Digital Multi-application Dryer
- Patent Pending "Stasis Software" for Challenging Sample Types
- Available in 1.25", 2.50" and 3.40" chamber sizes
- Winner of 2012 Microscopy Today Innovation Award
- Built-in Internal Condenser
- Delicate Slow Fill Path Through for Delicate Samples
- Precision process control
- Internal Filtration System Down to 0.08µm
- Optional "Quick Release" sample holder (down to 2 µm in size)
- Program and save custom recipes
- Made in U.S.A.
- Process up to 5 x 1" (25mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Filtration down to 0.08µm
- Made in U.S.A.
- Process up to 5 x 4" (100mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Filtration down to 0.08µm
- Made in U.S.A.
- Process up to 5 x 6" (150mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Filtration down to 0.08µm
- Made in U.S.A.
Application Images
Released cantilevers after thermal annealing Universite Catholique de Louvain
MEMS Shock Sensor (Multi-level) Naval Surface Warfare Center Indian Head, MD
Freestanding Cantilever Quantum NanoFab, University of Waterloo
Booth # 32
Date: December 18, 2024
Location: Banquet Hall on the Second Floor of Zhongfu Building ,No. 18 Gongti East Road,Chaoyang District, Beijing
Booth # 10
Date: January 20-23, 2025
Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan