Touchscreen Series C

TOUSIMIS HAS NOW INTEGRATED OUR AWARD WINNING AUTOSAMDRI®-931 SOFTWARE TECHNOLOGY WITH THE NEW SERIES C LINE HARDWARE TO FURTHER ENHANCE THE SERIES C

THE TOUSIMIS 'SERIES C' LINE HAS LED THE WAY IN RELIABILITY, YIELD, AND EFFICIENCY FOR OVER 15 YEARS IN BOTH INDUSTRIAL AND RESEARCH FACILITIES WORLDWIDE

  • A dedicated slow fill line allows for ideal internal chamber fluid dynamics for the most sensitive devices
  • Thermostatically controlled internal condenser
  • Temperature controlled valving
  • Stainless steel tubing with an internal filtration system down to 0.08 µm to protect samples and system function
  • Non mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices
  • Chamber flexibility with inserts and holders allowing for processing processing up to 8" wafers, pieces and die
  • Made in U.S.A.
  Request Quotation               Download Brochure (PDF)
Stasis Processing
•  Autosamdri®-934 (Cat #8788A)
      Touchscreen control automated CPD system for up to 5 x 4" Wafers
•  Automegasamdri®-936 (Cat #8788B)
      Touchscreen control automated CPD system for up to 5 x 6" Wafers
•  Automegasamdri®-938 (Cat #8788C)
      Touchscreen control automated CPD system for up to 5 x 8" Wafers

CPD Multi-Applications

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Electrostatic Actuator MCNC

Resistive IR Emitter Device MCNC

ARTIFICIAL EYELID ACTUATOR MCNC

Solderfan ETH, Switzerland

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Quotation

Request CPD Quotation
  • Bright LCD Touchscreen Control
  • Use Factory Default Automatic Settings or Create Custom Recipes
  • Optional "Stasis Software" (Patent Pending) for versatile sample types
  • Process up to 5 wafers per process run with each system
  • HF Compatible Wafer Holders and 10mm square holder included with each system
  • Tousimis® HF compatible Wafer Holders may be used to etch and process your wafers minimizing handling
  • Unique chamber inserts easily reduce chamber ID decreasing LCO2 consumption
  • High efficiency internal closed loop refrigeration integration
  • "Vortex Swirl" non-mechanical purge stirring (Patent Pending) eliminates moving parts for easy maintenance
  • Repeatable operating parameters insuring “reproducibility” of results
  • Static pressure control module helps insure automatic safe pressure stability
  • Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm
  • New 'Slow Fill' Control for the most delicate Sample Types
  • LCO2 flow is controlled through Micro Metering Valves with Vernier handles for precise flow control and easy position setting readjustment
  • Chamber illumination with view port facilitates chamber status visualization
  • All internal surfaces are inert to CO2, Acetone and Ultrapure Alcohols
  • Cleanroom static-free compatible design
  • External mounted Post Purge Filter Assembly for EZ preventive maintenance maintenance
  • The patented internal SOTER™ Condenser quietly captures and separates CO2 exhaust and waste alcohols
  • All electronic components meet CE, UL and/or U.S. Military Specifications