tousimis NEW Touchscreen Series C

Touchscreen Series C

TOUSIMIS HAS NOW INTEGRATED OUR AWARD WINNING AUTOSAMDRI®-931 SOFTWARE TECHNOLOGY WITH THE NEW SERIES C LINE HARDWARE TO FURTHER ENHANCE THE SERIES C

THE TOUSIMIS 'SERIES C' LINE HAS LED THE WAY IN RELIABILITY, YIELD, AND EFFICIENCY FOR OVER 15 YEARS IN BOTH INDUSTRIAL AND RESEARCH FACILITIES WORLDWIDE

A dedicated slow fill line allows for ideal internal chamber fluid dynamics for the most sensitive devices
Thermostatically controlled internal condenser
Temperature controlled valving
Stainless steel tubing with an internal filtration system down to 0.08 µm to protect samples and system function
Non mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices
Chamber flexibility with inserts and holders allowing for processing processing up to 8" wafers, pieces and die
Made in U.S.A.

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• Autosamdri®-934 (Cat #8788A)
Touchscreen control automated CPD system for up to 5 x 4" Wafers

• Automegasamdri®-936 (Cat #8788B)
Touchscreen control automated CPD system for up to 5 x 6" Wafers

• Automegasamdri®-938 (Cat #8788C)
Touchscreen control automated CPD system for up to 5 x 8" Wafers

Bright LCD Touchscreen Control
Use Factory Default Automatic Settings or Create Custom Recipes
Optional "Stasis Software" (Patent Pending) for versatile sample types
Process up to 5 wafers per process run with each system
HF Compatible Wafer Holders and 10mm square holder included with each system
Tousimis® HF compatible Wafer Holders may be used to etch and process your wafers minimizing handling
Unique chamber inserts easily reduce chamber ID decreasing LCO2 consumption
High efficiency internal closed loop refrigeration integration
"Vortex Swirl" non-mechanical purge stirring (Patent Pending) eliminates moving parts for easy maintenance
Repeatable operating parameters insuring “reproducibility” of results
Static pressure control module helps insure automatic safe pressure stability
Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm
New 'Slow Fill' Control for the most delicate Sample Types
LCO2 flow is controlled through Micro Metering Valves with Vernier handles for precise flow control and easy position setting readjustment
Chamber illumination with view port facilitates chamber status visualization
All internal surfaces are inert to CO2, Acetone and Ultrapure Alcohols
Cleanroom static-free compatible design
External mounted Post Purge Filter Assembly for EZ preventive maintenance maintenance
The patented internal SOTER™ Condenser quietly captures and separates CO2 exhaust and waste alcohols
All electronic components meet CE, UL and/or U.S. Military Specifications