Autosamdri®-934
- The New Supercritical Autosamdri®-934 System was developed by our in-house design team whose goal was to listen to and incorporate your needs into our next generation.
- The classic features you have come to expect for decades that enable smooth operation, precise control and reproducibility are again evident in our most current design!
- Process up to Five 4" (100mm) Wafers per Process Run
- Touchscreen Programmable Interface
- First Time Ever...Previous Run Data Review
- Integrated Chiller Loop Decreases LCO2 Consumption
- Easy Facilitation with Small Foot Print Design
Application Images
MEMS Based Resonant Device Cornell Nanoscale Facility and Department of Applied Physics, USA
B Lock & Stepper University of California at Los Angeles
Thermal Actuated Actuators Universite Catholique de Louvain
Magnetic Resonance Force Microscope Korea Research Institute of Standards and Science (KRISS), Korea
- A dedicated initial Slow Fill into the process chamber allows ideal fluid dynamics preserving the most sensitive micro devices.
- Maintenance made easy via accessible components including the external Post-Purge-Filter assembly.
- Patent Pending "Vortex Swirl": Non-mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices.
- Extremely Efficient integrated Closed Cooling Loop dropping chamber temperature quickly for shorter process run times.
- The internal SOTER(tm) condenser quietly captures and separates CO2 exhaust and waste alcohols.
- Our original Chamber Inserts enable chamber I.D. variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
- Process chamber LCO2 filtration down to 0.08µm with 99.999%+ particle retention.
- Processes up to five 4" (100mm) wafers each run. Included are the following HF Compatible Wafer Holders: 4" (100mm), 3" (75mm), 2" (50mm) and 10mm Die Holders.
- Chamber Illumination via viewing window facilitates chamber status visualization.
- Automatic process with factory default recipe or the ability to customize your own!
- All internal surfaces are inert to CO2 and ultrapure alcohols.
- Repeatable operating parameters insuring "reproducibility" of results.
- Safety operation features integrated into both temperature and pressure automatic regulation.
- All electronic components meet CE, UL and/or U.S. Military Specifications.
- Clean room static-free compatible design.
- Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
- System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
- Chamber size: 4.50" I.D. x 1.25" Depth / Chamber volume: 326 ml
- 120V or 220V / 50-60Hz
- LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.
- High Pressure LCO2 flexi-SS316 Braided line for safe operation and easy installation 10ft/3m length included with system (Other lengths available upon request up to 100 ft/30m).
- Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose.
- Static free exhaust tubing included for all exhaust ports.
- Spare chamber O-rings (3), chamber lamp (1), and slo-blow fuses (2x3A and 2x8A).
- Chamber Inserts included: 4" to 3" / 3" to 2" / 2" to 1.25" ! Allows for multiple wafer size drying.
- HF compatible wafer holders included: 4" (100mm), 3" (75mm), 2" (50mm) and 10mm square die. Each holder can load up to five substrates each.
- 2 year warranty on all parts and labor.
- Free lifetime technical support.
- 8760-02: :KNURL NUT for 4" and 6" Process Chamber
- 8760-41: :3 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8760-42: :8 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8770-13: :LED CHAMBER LAMP, 120V
- 8770-32: :HIGH-PRESSURE HOSE, 5ft
- 8770-33: :HIGH-PRESSURE HOSE, 10ft
- 8770-60: :CHAMBER LID for 4" Process Chamber
- 8785: :Double T-Filter Assembly
- 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
- 8784-05: :Gasket for LCO2 Tank Connect
- 8770-51T/815B: :O-Ring for Autosamdri®-934 and Autosamdri®-815B
- 8770-46: :Flow Meter - Use with any 2.5", 3.4" and 4.0" dia. Autosamdri® Chamber (60 SCFH)
- 8770-54: :LCO2 TANK SCALE W/ REMOTE DISPLAY
- 8768B: :4" - 100mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768C: :3" - 75mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768D: :2" - 50mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768G: :1" - 25mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die
Date: May 28-30, 2025
Location: The Commons, Yonsei University, Seoul, Korea