- High efficiency internal closed loop refrigeration.* (22°C to operational in less than 5 minutes)!
- Post-Purge-Filter easily accessible for maintenance ease.*
- The patented internal SOTER™ condenser* quietly captures and separates CO2 exhaust and waste alcohols.
- Unique chamber inserts* enable variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
- Process up to 5 x 8" wafers per process run. Also comes with additional HF Compatible Wafer Holders* to process 5 x 6", 5 x 4", 5 x 3", 5 x 2" diameter wafers or 5 x 10mm square die (tousimis® HF compatible Wafer Holders* may be used to etch and process your wafers minimizing handling).
- Chamber illumination with viewing window facilitates chamber status visualization.*
- Microprocessor controller allows for completely automatic processing.*
- All internal surfaces are inert to CO2 and ultrapure alcohols.
- Repeatable operating parameters insuring "reproducibility" of results.
- Static pressure control module helps insure automatic safe pressure stability.
- Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm.
- Control panel LED's instantly indicate process mode at a glance.
- Clean room static-free compatible design.
- All electronic components meet CE, UL and/or U.S. Military Specifications.
Automegasamdri®-916B, Series C
- Process up to 8" wafers
- Fully Automatic Process
- Low LCO2 Consumption
- Small Foot Print design
- Minimal Facility Utility Requirements
- Made in U.S.A.
- The New Supercritical Automegasamdri®-916B, Series C System was developed by Dr. A. J. Tousimis and our team of long-standing associates within the tousimis® SAMDRI design group.
- Smooth operation and precise control are the Supercritical Automegasamdri®-916B's trademark; wafer holders and inserts are provided that allow flexible CPD processing of 8", 6", 4", 3", 2" wafers as well as 10mm square die.
Features
Specifications
Standard Accessories
Optional Accessories
CPD MULTI-APPLICATIONS
- Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
- System Set-Up Area Footprint: 27" (68.5cm) Width x 38" (96.5cm) Depth
- Chamber size: 8.50" I.D. x 1.25" Depth / Chamber volume: 1162 ml
- Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000 psi
- 120V / 50-60Hz (Other voltage units also available. Please Inquire)
- LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.*
- LCO2 High Pressure braided stainless steel inert Teflon® lined hose. 10ft (~ 3m) long for clean room operation (at a nominal charge, other lengths available upon request ).
- Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose. Flows LCO2 twice thru 0.5µm filters with 99.5% particulate retention prior to LCO2 entering Automegasamdri®-916B.
- Tool set included for connecting LCO2 chamber supply line.
- Static free exhaust tubing for all exhaust outlets.
- Internal stainless and nickel scintered filtration systems incorporated to protect lines, wafers, and valves down to 0.08µm.
- Spare chamber O-rings (3), chamber lamp (1), and slo-blow fuses (2x3A and 2x8A).
- Complete wafer size process flexibility! 5 chamber inserts* enable 8.5" chamber I.D. reduction down to smaller chamber I.D. sizes for processing wafers and die from a range including: 8", 6", 4", 3", 2", and 1.25" ! Allows for multiple wafer size drying.
- 8", 6", 4", 3", 2" diameter wafer holders and 10mm square die holders included. Holders are HF compatible and can hold up to 5 wafers or die each.
- 2 year warranty on all parts and labor. Free lifetime technical support consultations by our scientific staff.
- 8760-02: :KNURL NUT for 4" and 6" Process Chamber
- 8760-41: :3 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8760-42: :8 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C
- 8770-10: :CHAMBER LAMP, 120Volt/60Hz
- 8770-32: :HIGH-PRESSURE HOSE, 5ft
- 8770-33: :HIGH-PRESSURE HOSE, 10ft
- 8770-80: :CHAMBER LID for 4" Process Chamber
- 8785: :Double T-Filter Assembly
- 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
- 8784-05: :Gasket for LCO2 Tank Connect
- 8770-51T/916B: :O-Ring for AutomegaSamdri®-938 and AutomegaSamdri®-916B
- 8770-48: :Flow Meter - Use with Automegasamdri®-938 or Automegasamdri®-916B(180 SCFH)
- 8770-53: :POWER CABLE
- 8770-54: :LCO2 TANK SCALE W/ REMOTE DISPLAY
- 8770-56A: :Step-Down Transformer, 200-240V → 110-120V, 3000W
- 8770-83A: :Internal 0.5µm 316SS Particulate Line Filter
- 8768H: :8" - 200mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768A: :6" - 150mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768F: :5" - 125mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768B: :4" - 100mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768C: :3" - 75mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768D: :2" - 50mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768G: :1" - 25mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die
Application Images
Silicon Microrobots - Leg of Robot University of California at Berkeley and Micropropulsion Corp. USA
Rotary Microfan with Rotary Motor ETH, Switzerland
Released cantilevers after thermal annealing Universite Catholique de Louvain
High aspect ratio silicon gratings Massachusetts Institute of Technology
Booth # 32
Date: December 18, 2024
Location: Banquet Hall on the Second Floor of Zhongfu Building ,No. 18 Gongti East Road,Chaoyang District, Beijing
Booth # 10
Date: January 20-23, 2025
Location: Kaohsiung Exhibition Center, Kaohsiung, Taiwan