Automegasamdri®-916B, Series C

  • Process up to 8" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8786D
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  • The New Supercritical Automegasamdri®-916B, Series C System was developed by Dr. A. J. Tousimis and our team of long-standing associates within the tousimis® SAMDRI design group.
  • Smooth operation and precise control are the Supercritical Automegasamdri®-916B's trademark; wafer holders and inserts are provided that allow flexible CPD processing of 8", 6", 4", 3", 2" wafers as well as 10mm square die.
  • High efficiency internal closed loop refrigeration.* (22°C to operational in less than 5 minutes)!
  • Post-Purge-Filter easily accessible for maintenance ease.*
  • The patented internal SOTER™ condenser* quietly captures and separates CO2 exhaust and waste alcohols.
  • Unique chamber inserts* enable variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
  • Process up to 5 x 8" wafers per process run. Also comes with additional HF Compatible Wafer Holders* to process 5 x 6", 5 x 4", 5 x 3", 5 x 2" diameter wafers or 5 x 10mm square die (tousimis® HF compatible Wafer Holders* may be used to etch and process your wafers minimizing handling).
  • Chamber illumination with viewing window facilitates chamber status visualization.*
  • Microprocessor controller allows for completely automatic processing.*
  • All internal surfaces are inert to CO2 and ultrapure alcohols.
  • Repeatable operating parameters insuring "reproducibility" of results.
  • Static pressure control module helps insure automatic safe pressure stability.
  • Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm.
  • Control panel LED's instantly indicate process mode at a glance.
  • Clean room static-free compatible design.
  • All electronic components meet CE, UL and/or U.S. Military Specifications.
  • Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
  • System Set-Up Area Footprint: 27" (68.5cm) Width x 38" (96.5cm) Depth
  • Chamber size: 8.50" I.D. x 1.25" Depth / Chamber volume: 1162 ml
  • Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000 psi
  • 120V / 50-60Hz (Other voltage units also available. Please Inquire)
  • LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.*
Standard Accessories
  • LCO2 High Pressure braided stainless steel inert Teflon® lined hose. 10ft (~ 3m) long for clean room operation (at a nominal charge, other lengths available upon request ).
  • Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose. Flows LCO2 twice thru 0.5µm filters with 99.5% particulate retention prior to LCO2 entering Automegasamdri®-916B.
  • Tool set included for connecting LCO2 chamber supply line.
  • Static free exhaust tubing for all exhaust outlets.
  • Internal stainless and nickel scintered filtration systems incorporated to protect lines, wafers, and valves down to 0.08µm.
  • Spare chamber O-rings (3), chamber lamps (2), and slo-blow fuses (2x3A and 2x8A).
  • Complete wafer size process flexibility! 5 chamber inserts* enable 8.5" chamber I.D. reduction down to smaller chamber I.D. sizes for processing wafers and die from a range including: 8", 6", 4", 3", 2", and 1.25" ! Allows for multiple wafer size drying.
  • 8", 6", 4", 3", 2" diameter wafer holders and 10mm square die holders included. Holders are HF compatible and can hold up to 5 wafers or die each.
  • 2 year warranty on all parts and labor. Free lifetime technical support consultations by our scientific staff.
Optional Accessories
  • 8760-02: :KNURL NUT for tousimis® Autosamdri®-815B and Automegasamdri®-915B
  • 8760-41: :3 AMP FUSE for Autosamdri® and Automegasamdri® Series C
  • 8760-42: :8 AMP FUSE for Autosamdri® and Automegasamdri® Series C
  • 8770-10: :CHAMBER LAMP, 120Volt/60Hz
  • 8770-32: :HIGH-PRESSURE HOSE, 5ft
  • 8770-33: :HIGH-PRESSURE HOSE, 10ft
  • 8770-80: :CHAMBER LID for tousimis AutomegaSamdri®-916B
  • 8785: :Double T-Filter Assembly
  • 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
  • 8784-05: :Gasket for LCO2 Tank Connect
  • 8770-51T/916B: :O-Ring for AutomegaSamdri®-916B
  • 8770-48: :Flow Meter - Use with Automegasamdri®-916B (180 SCFH)
  • 8770-53: :POWER CABLE
  • 8770-56A: :Step-Down Transformer, 200-240V → 110-120V, 3000W
  • 8770-83A: :Internal 0.5µm 316SS Particulate Line Filter
  • 8768H: :8" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768A: :6" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768F: :5" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768B: :4" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768C: :3" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768D: :2" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768G: :1" HF Compatible Wafer Holder, Holds 5 Wafers
  • 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die

Application Images

RF MEMS Capacitive Switch NASA-Glenn Research Center/Communications Technology Division, USA

E-beam resist pattern quality after CPD Process NRL Nano Fab - Washingtopn, DC

Tiltable Microplatform University of Michigan at Ann Arbor, Department of Engineering

Array of low stress silicon nitride coupled oscillators with gold actuation leads. 1,100x Cornell Nanoscale Facility and Department of Applied Physics, USA