Autosamdri®-815B, Series B

  • Process up to 4" (100mm) wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C
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  Operational Demo Video
  • The Supercritical Autosamdri®-815B, Series B System was developed by Dr. A. J. Tousimis and our team of long-standing associates within the tousimis® SAMDRI design group.

  • Smooth operation and precise control are the Supercritical Autosamdri®-815B´s trademark; wafer holders and inserts are provided that allow anti-stiction processing up to 5 pieces of either 4" (100mm), 3" (75mm), 2" (50mm) wafers or 10mm square die per process run!
Features
  • Microprocessor controller allows for complete automatic processing.*
  • All internal surfaces are inert to CO2 and ultra pure alcohols.*
  • Repeatable operating parameters insuring reproducibility of results.*
  • Integrated temperature controls.*
  • Internal rupture disc built in for safety. *
  • Processes up to 5 x 4" (100mm) diam. wafers per run; comes with additional HF compatible wafer holders to process 5 x 3" (75mm), 5 x 2" (50mm) diameter wafers or 5 x 10mm square die (Tousimis HF compatible Wafer Holders* can be used to transport and process your wafers and die from HF).
  • All electronic components meet CE, UL and/or U.S. Military Specifications.
  • Static pressure control module pre-set for automatic safe pressure stability.
  • 0.08µm internal filtration system delivers clean filtered LCO2 to process chamber. *
  • Under-lit chamber with viewing window facilitates operator chamber status viewing.
  • An efficient adiabatic cooling system*, capable of cooling the chamber from ambient room temperature to near 0°C, in less than 3 minutes and maintains temperature automatically during both FILL and PURGE modes.*
  • LED's instantly indicate process mode at a glance.*
  • Clean room static-free compatible design.
  • For added safety and convenience, the U.S. Patented SOTER™ condenser* quietly captures exhaust and alcohols.
  • Unique chamber inserts* allow variance of chamber I.D. This maximizes efficiency in LCO2 consumption and processing time.
Specifications Standard Accessories Optional Accessories CPD MULTI-APPLICATIONS

Application Images

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