- Clean room static-free compatible design.
- Microprocessor controller allows for complete automatic processing.*
- All internal surfaces are inert to CO2 and ultra pure alcohols.*
- Repeatable operating parameters insuring reproducibility of results.*
- LED's instantly indicate process mode at a glance.*
- Integrated temperature controls.*
- Processes up to 5 x 6" (150mm) diam. wafers per run; comes with additional HF compatible wafer holders to process 5 x 4" (100mm), 5 x 3" (75mm), 5 x 2" (50mm) diameter wafers or 5 x 10mm square die (Tousimis HF compatible Wafer Holders* can be used to transport and process your wafers and die from HF).
- All electronic components meet CE, UL and/or U.S. Military Specifications.
- Internal rupture disc built in for safety.*
- Static pressure control module pre-set for automatic safe pressure stability.
- An efficient adiabatic cooling system*, capable of cooling the chamber from ambient room temperature to near 0°C, in less than 3 minutes, maintains temperature automatically during both FILL and PURGE modes.*
- For added safety and convenience, U.S. Patented SOTER Condenser* quietly captures exhaust and alcohols.
- Under-lit chamber with viewing window facilitates operator chamber status viewing.
- 0.08µm internal filtration system delivers clean filtered LCO2 to process chamber.*
- Unique chamber inserts* allow variance of chamber I.D. This maximizes efficiency in LCO2 consumption and processing time.