• A dedicated slow fill line allows for ideal internal chamber fluid dynamics for the most sensitive devices
  • Thermostatically controlled internal condenser
  • Temperature controlled valving
  • Stainless steel tubing with an internal filtration system down to 0.08 µm to protect samples and system function
  • Non mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices
  • Chamber flexibility with inserts and holders allowing for processing processing up to 8" wafers, pieces and die
  • Made in U.S.A.

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  • Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • Process up to 8" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8786D

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  • Process up to 6" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785D

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  • Process up to 6" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785C

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  • Process up to 4" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780D

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  • Process up to 4" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C

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  • Large Capacity Fully Automatic Critical Point Dryer
  • Process large or numerous smaller samples

      

tousimis catalog# 8780B

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  • Process up to 1" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8779C

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  • The fully Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8779B

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  • The Semi Automatic Critical Point Dryer
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8778B

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  • The Manual Critical Point Dryer with advanced auto-pressure and temperature control
  • 1.25" ID chamber and 1.25" height
tousimis catalog# 8755B

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Application Images

Macrophages and Endothelial Cells The University of Texas Health Science Center at Houston

Enterobacteria Clorox

Globba Cernua Antherwings Royal Botanic Gardens Kew. UK

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Upcoming Exhibitions and Conferences

Visit us at the Entomology 2017 Meeting

Date: November 5-8, 2017

Location: The Colorado Convention Center in Denver, Colorado

Booth: # 616

We are pleased to invite you to MEMS 2018 
 

Booth # 22

Date: January 21-25, 2016

Location: Belfast Waterfront, Belfast, Northern Ireland